High conductance trap

Gas separation: processes – Filtering

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Details

553151, B01D 4600

Patent

active

061029890

ABSTRACT:
A high conductance trap for removing particulates from the effluent of a semiconductor processing system. The trap includes a housing having a gas inlet, a filtering arrangement, and a gas outlet. The gas inlet and gas outlet are arranged in an inline configuration to increase conductance through the trap, thereby enhancing the filtering efficiency of the filtering arrangement. Cooling coils are disposed immediately adjacent the gas inlet to immediately cool the effluent as it enters the trap, thereby further increasing the filtering efficiency of the filter arrangement.

REFERENCES:
patent: 4668261 (1987-05-01), Chatzipeteros et al.
patent: 4892653 (1990-01-01), Latge
patent: 4928497 (1990-05-01), Latge
patent: 5261963 (1993-11-01), Basta et al.
patent: 5427610 (1995-06-01), Croker

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