High concentration silica slurry

Abrasive tool making process – material – or composition – With inorganic material – Clay – silica – or silicate

Reexamination Certificate

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Details

C106S003000, C106S482000, C438S692000, C438S693000, C516S034000, C423S335000, C423S336000, C423S337000, C423S338000, C423S339000

Reexamination Certificate

active

10718573

ABSTRACT:
A high concentration silica slurry can be used for polishing of substrates, such as semiconductor materials. The slurry contains a silica powder dispersed in an solvent. The silica slurry has a silica concentration of more than 50% by weight and a viscosity of less than 1000 mPa·s, wherein the silica powder has a ratio DL/DT of less than 1.3, wherein DL is an average particle size of the silica powder measured by a laser diffraction particle size distribution method and DT is an average primary particle size of the silica powder measured by a TEM photography observation, and wherein the silica powder has an average primary particle size of from 0.08 μm to 0.8 μm.

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