High concentration phosphoro-silica spin-on dopant

Details High concentration phosphoro-silica spin-on dopant High concentration phosphoro-silica spin-on dopant

1977-11-21

1981-01-06

Smith, John D.

Compositions: coating or plastic

Coating or plastic compositions

Silicon containing other than solely as silicon dioxide or...

106 74, 10628717, 10628729, 148188, 148 22, 252950, 427 85, 427 93, 427240, H01L 2122

Patent

active

042434270

ABSTRACT:
A coating composition useful for forming a high concentration phosphoro-silica spin-on dopant is disclosed. The coating composition is formed by the steps of heating a solution of mono-aluminum phosphate, adding a methyl alcohol to the hot solution so as to decrease the viscosity to a predetermined level, permitting the now diluted mono-aluminum phosphate solution to cool and mixing the cooled solution with an alcoholic solution of tetraethylorthosilicate. The present invention is also directed to semiconductor devices coated with the coating composition described hereinabove.

REFERENCES:
patent: 3486951 (1969-12-01), Norby
patent: 3789023 (1974-01-01), Ritchie
patent: 3834939 (1974-09-01), Beyer et al.
patent: 3841927 (1974-10-01), Florence et al.
patent: 3915766 (1975-10-01), Pollack et al.
patent: 3998668 (1976-12-01), Florence et al.
Mellor, "A Comprehensive Treatise on Inorganic and Theoretical Chemistry," vol. V, pp. 362, 363, .COPYRGT.1924.

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