High accuracy fabrication of X-ray masks with optical and E-beam

Details High accuracy fabrication of X-ray masks with optical and E-beam High accuracy fabrication of X-ray masks with optical and E-beam

1996-06-14

1998-05-26

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

378 34, 378 35, G03F 900

Patent

active

057562342

ABSTRACT:
X-ray lithography is used in the fabrication of very large scale integrated circuits. Optical lithography techniques are used to create a preliminary mask with coarse features in the preparation of a high resolution x-ray mask. The E-beam tool may register the location of the E-beam relative to the optically written coarse features. This helps the tool to navigate according to the location of specific features.

REFERENCES:
patent: 4610948 (1986-09-01), Glendinning
patent: 5227269 (1993-07-01), Scott
patent: 5306584 (1994-04-01), Palmer
patent: 5656399 (1997-08-01), Abate et al.

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