High accuracy beam blanker

Details High accuracy beam blanker High accuracy beam blanker

1991-05-29

1994-01-04

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

3133611, H01J 37147

Patent

active

052763307

ABSTRACT:
The accuracy of a double-deflection beam blanker is dramatically improved for all blanker voltages by using provided, closed-form, trajectory equations to determine the blanker geometric parameters and compensating for fringe-field effects in order to precisely determine the delay line length for control of an electron or ion beam. This delay line length is maintained by placing alignment apertures above and below the blanker.

REFERENCES:
patent: 3676693 (1972-07-01), Guernet
patent: 4169229 (1979-09-01), Feuerbaum
patent: 4409487 (1983-10-01), Kuschel et al.
patent: 4445041 (1984-04-01), Kelly et al.
patent: 4507559 (1985-03-01), Plies
patent: 4560878 (1985-12-01), Knauer et al.
Journal of Vacuum Science and Technology: Part B. vol. 8, No. 6, Nov. 1990, New York US pp. 1666-1672; M. Gesley and P. Condran: "Electron Beam Blanker Optics" *abstract* p. 1667, left column, paragraph 2- p. 1668, left column, paragraph 1* p. 1669, left column, paragraph 4- right column, paragraph 2* p. 1671, right column, paragraph 3 - paragraph 4; figures 1,2*.
Patent Abstracts of Japan vol. 14, No. 429 (E-978) 14 Sep. 1990 & JP-A-2 165 549 (JEOL Ltd.) 26 Jun. 1990 *abstracts*.

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