HFCVD method for producing thick, adherent and coherent polycrys

Details HFCVD method for producing thick, adherent and coherent polycrys HFCVD method for producing thick, adherent and coherent polycrys

1990-09-13

1993-02-16

Beck, Shrive

Coating processes

Direct application of electrical, magnetic, wave, or...

Chemical vapor deposition

427249, 427314, 427587, 428408, B05D 306, C23C 1626

Patent

active

051869730

ABSTRACT:
A method for depositing a thick, adherent and coherent polycrystalline diamond (PCD) film onto a metallic substrate using a deposition rate of no greater than 0.4 .mu.m per hour. The resulting PCD Film has a smooth surface finish, enhanced crystal orientation in comparision to industrial grade diamond powder particularly in the (220) and (400) directions, and excellent electrical and thermal properties. The method enables one to deposit PCD films having a thickness of at least 12 microns for applications on flat as well as curved substrates having wide use in the electronics industry. Thick PCD films of this invention have been found to be ideal for dissipating heat from radio frequency (RF) and microwave (MW) devices.

REFERENCES:
patent: 4816286 (1989-03-01), Hirose
patent: 4849290 (1989-07-01), Fujimori et al.
patent: 4919974 (1990-04-01), McCune et al.
patent: 4940015 (1990-07-01), Kobashi et al.

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