HF sustained, DC discharge driven negative ion source with autom

Details HF sustained, DC discharge driven negative ion source with autom HF sustained, DC discharge driven negative ion source with autom

1995-07-31

1996-12-03

Pascal, Robert

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

31511191, 3133621, 250423F, H01J 724

Patent

active

055811566

ABSTRACT:
A negative ion source with an automatic control system wherein a low power igh frequency discharge is used to sustain a high power low voltage dc discharge in a chamber that magnetically confines the plasma produced. The low power high frequency discharge and the high power low voltage direct current discharge are two discharges along with the gas flow rate which are independently adjusted, automatically, so that the conditions for optimum production of vibationally excited hydrogen molecules consistent with the production of maximum H.sup.- output current is obtained and maintained. This chamber is separated by a magnetic filter field from a second chamber which maintains the low temperature plasma in the second chamber necessary for the optimum production of H.sup.- ions by the process of dissociative attachment, utilizing the vibrationally excited molecules produced by the first chamber.

REFERENCES:
patent: 4377773 (1983-03-01), Hershcovitch et al.
patent: 4447732 (1984-05-01), Leung et al.
patent: 4559477 (1985-12-01), Leung et al.
patent: 5391962 (1995-02-01), Roberts et al.

Affiliated with

Also associated with

Rating

HF sustained, DC discharge driven negative ion source with autom does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with HF sustained, DC discharge driven negative ion source with autom, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and HF sustained, DC discharge driven negative ion source with autom will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-788025