HF-CVD method for forming diamond

Details HF-CVD method for forming diamond HF-CVD method for forming diamond

1994-06-13

1995-06-13

King, Roy V.

Coating processes

Coating by vapor, gas, or smoke

Carbon or carbide coating

4272555, 427122, 4272551, 428408, 423446, C23C 1626

Patent

active

054240964

ABSTRACT:
Diamond is produced by chemical vapor deposition on a substrate by hot filament activation of a hydrogen-hydrocarbon gas mixture. An edge of the substrate faces the filament at a distance; therefrom up to about 1 mm. and preferably about 0.3-0.7 mm., and the substrate is moved relative to the filament to maintain this spacing as diamond forms thereon. Diamond formation proceeds at an improved rate, and in single crystal configuration under certain conditions.

REFERENCES:
patent: 4816286 (1989-03-01), Hirose
patent: 4953499 (1990-09-01), Anthony et al.
Aikyo et al, "Diamond Synthesis Suppressing the Thermal Decomposition of Methane in a Hot-Filament CVD", Jpn. J. Appl. Phys. 28(9) Sep. 1989, pp. L1631-L1633.

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