Hexafluoropropylene oxide compounds and a method of making same

Details Hexafluoropropylene oxide compounds and a method of making same Hexafluoropropylene oxide compounds and a method of making same

1994-03-01

1995-05-09

Killos, Paul J.

Organic compounds -- part of the class 532-570 series

Organic compounds

Carboxylic halides

568415, 568416, C07C 5158

Patent

active

054141192

ABSTRACT:
Hexafluoropropylene oxide (HFPO) compounds, including polymers, expressed by the general chemical formula (1) below: ##STR1## wherein R.sup.1 is a single bond, an alkylene group of 1 to 10 carbon atoms, or said alkylene group in which a part of, or all of, the hydrogen atoms are substituted by fluorine atoms, Rf is a fluorine atom, a perfluoroalkyl group of 1 to 10 carbon atoms, or a perfluoroalkyl ether group, and n is 0 or an integer of at least 1. A manufacturing method for the HFPO compounds which is characterized by the reaction between hexafluoropropylene oxide and a vinyl group containing compound, expressed by the general chemical formula (2) below: ##STR2## wherein R.sup.1 and Rf are same as above. The compounds have utility as important intermediate raw materials for the production of novel functional silicone compounds having HFPO polymer units.

REFERENCES:
patent: 3114778 (1963-12-01), Gerhard et al.
patent: 3274239 (1966-09-01), Selmann
patent: 3311658 (1967-03-01), Warnell
patent: 3322826 (1967-05-01), Moore
patent: 3721696 (1973-03-01), Sianesi
patent: 4081466 (1978-03-01), Resnick
patent: 4153804 (1979-05-01), Yamabe et al.

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