Heterostructure field effect transistor including a pulse doped

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor

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257194, H01L 29784, H01L 29812, H01L 2980

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active

054649951

ABSTRACT:
The present invention relates to a heterostructure yield effect transistor with high charge carrier mobility and velocity wherein the current carrying channel has only a narrow pulse doped region that is disposed on the side of the channel layer opposite the heterojunction. At positive gate voltages the remainders of the doping substance are spatially separated from the free charge carriers so that the free charge carriers exhibit transporting characteristics as they are encountered in the undoped channel but with a substantially higher saturation current.

REFERENCES:
patent: 4593301 (1986-06-01), Inata et al.
patent: 5032893 (1991-07-01), Fitzgerald, Jr. et al.
patent: 5155571 (1992-10-01), Wang et al.
patent: 5262660 (1993-11-01), Streit et al.
patent: 5266506 (1993-11-01), Green, Jr.
Smith et al; "A 0.25 .mu.m gate-length Pseudomorphic HFET with 32-mW output power at 94 GHz"; IEEE Electron device Letters; vol. 10; No. 10; Oct. 1989.
S. M. Sze; "Semiconductor devices physics and Technology"; 1985 pp. 267-268.
Liu et al; "Analysis of Several . . . ", 1991 pp. 253-258.
Saunier et al; "AlGaAs/InGaAs Heterostructures . . . ", Oct. 1989.
Patent Abstracts of Japan, vol. 010, No. 367 (E-462) Dec. 9, 1986, JP-A-61 161 773 (Matsushita Electric Ind. Co. Ltd), Jul. 22, 1986.
Patent Abstracts of Japan, vol. 13, No. 348 (E-799) (3696) Aug. 4, 1989, JP-A-10 108 779 (Fujitsu), Apr. 26, 1989.
Papaioannou et al., "Psuedomorphic InGaAs HEMTs . . . " Superlattices and Microstructures, vol. 8, No. 3, 1990, pp. 341-344.
IEEE Electron Device Letters, vol. 9, No. 8, Aug. 1988 Paul Saunier et al.: "A Double-Heterojunction . . . ".
IEEE Transactions On Electron Devices, vol. 36, No. 10 Oct. 1989; Paul Saunier et al.: "A1GaAs/InGaAs Heterostructures . . . ".
IEEE Journal of Quantum Electronics, vo. QE-22, No. 9, Sep. 1986; Hiroyuki Sakaki: "Physical Limits of . . . ".
IEEE Journal Of Applied Physics, vol. 30, No. 2A, Feb. 1991, pp. L 166-L 169; Kohji Matsumura et al.: "A New Hight Electron . . . ".
IEEE Transactions On Electron Devices, vol. 37, No. 10 Oct. 1990; P. Paul Ruden et al.: "A1GaAs/InGaAs/GaAs Quantum Well . . . ".

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