Heterojunction semiconductor device with <001> tilt

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357 16, 357 17, 357 34, 357 22, H01L 2904

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048720461

ABSTRACT:
A method is disclosed of epitaxially depositing a semiconductor material on a substrate of different material while accommodating lattice mismatch in a manner that results in improved epitaxially deposited material. In a disclosed embodiment GaAs is epitaxially deposited by molecular beam epitaxy on a silicon substrate having a {100} crystallographic surface tilted in the <001> direction. Improved semiconductor devices, made using the disclosed technique, are also set forth.

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This invention was made with Government support under contract F49620-83-K-0021 awarded by the United States Air Force. The Government has certain rights in this invention.

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