Heterojunction field effect transistor and method of fabricating

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor

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257194, 257284, H01L 31072

Patent

active

061440485

ABSTRACT:
A Schottky barrier layer in separate regions between a source electrode and a gate electrode and between a drain electrode and the gate electrode is completely covered with an etching stopper layer. The gate electrode is separated from a cap layer.

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A Recessed-Gate InAlAs
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Adeside I et al., Reactive Ion Etching Of Submicrometer Structes In Inp, Sep. 11-14, 1988, No. Symp 15, Sep. 11, 1988, pp. 425-430.
Enoki T et al., Topical Workshop on Heterostructure Microelectronics, Aug. 18-21, 1996, vol. 41, No. 10, pp. 1651-1656.

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