Heterojunction bipolar transistor having non-uniformly doped...

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Bipolar transistor

Reexamination Certificate

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C257S198000

Reexamination Certificate

active

07012288

ABSTRACT:
The safe-operating area (SOA) in a heterojunction bipolar transistor (HBT) is improved by providing a collector region in the transistor having a graded (uniformly or stepped) doping between the base region and the underlying subcollector region with the collector doping being lower near the base and higher near the subcollector and with the collector doping being less than the doping of the subcollector. The non-uniformly doped collector reduces Kirk effect induced breakdown when collector current increases.

REFERENCES:
patent: 4951115 (1990-08-01), Harame et al.
patent: 5198682 (1993-03-01), Wu et al.
patent: 6531721 (2003-03-01), Burton et al.
S. Wolf, “Silicon Processing for the VLSI Era, vol. 2—Process Integration,” Lattice Press, Sunset Beach, CA (1990), pp. 467-468.
Fullowan et al., “Improved Breakdown of AllnAs/InGaAs Heterojunction Bipolar Transistors”, Electronics Letters, vol. 27, pp. 2340-2341, Dec. 1991.
Hassan et al., “Control of Current-Mode Second Breakdown in Transistors Through Use of Double-Graded Collectors”, Solid-State Electronics, vol. 33, No. 10, pp. 1217-1221, 1990.
Pfost et al., “Optimization of the Collector Profile of InGaP/GaAs HBTs for Increased Robustness”, 25thIEEE GaAsIC Symposium, Nov. 9-12, pp. 115-118, 2003.

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