Heterojunction bipolar transistor having a base region of german

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357 34, 357 61, 148DIG11, 148DIG58, 148DIG56, 148DIG67, 148DIG72, H01L 29161, H01L 2972, H01L 2920

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047164450

ABSTRACT:
The heterojunction bipolar transistor has a structure of wide band-gap transistor and comprises a collector region having an N-type GaAs layer, a base region having a P-type germanium layer formed on the N-type GaAs layer, and an emitter region having an N-type semiconductor layer of mixed crystal of silicon and germanium formed on the P-type germanium layer. The mixed crystal of the N-type semiconductor layer may have a uniform distribution of silicon or a graded distribution of silicon in which a content of silicon is zero at the surface facing the P-type germanium layer and is continuously increased with distance from the surface facing the P-type germanium layer.

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patent: 3766447 (1973-10-01), Mason
patent: 4119994 (1978-10-01), Jain et al.
patent: 4396931 (1983-08-01), Dumke et al.
patent: 4593305 (1986-06-01), Kurata et al.
H. Kroemer, "Heterostructure Bipolar Transistors and Integrated Circuits", Proceedings of the IEEE, vol. 70, No. 1, Jan. 1982, pp. 13-25.
"OYO BUTURI", Japanese Society of Applied Physics, vol. 54, No. 11, pp. 1192-1197, 7/15/85.

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