Active solid-state devices (e.g. – transistors – solid-state diode – Specified wide band gap semiconductor material other than... – Diamond or silicon carbide
Patent
1992-06-19
1993-09-21
Hille, Rolf
Active solid-state devices (e.g., transistors, solid-state diode
Specified wide band gap semiconductor material other than...
Diamond or silicon carbide
257 76, 257197, 257198, 257 49, H01L 310312, H01L 310256, H01L 31072, H01L 31109
Patent
active
052471926
ABSTRACT:
A heterojunction bipolar transistor comprising a semiconductor substrate of a first conductive-type, a first conductive-type layer of 3c-SiC, a second conductive-type layer of Si and another first conductive-type layer of 3c-SiC. The two first conductive-type layers serve respectively as collector region and emitter region and the second conductive-type layer serves as base region, and a method for producing the same. A transistor of the present invention is effective for devices such as I.sup.2 L circuit wherein reverse directional operation of transistor is utilized.
REFERENCES:
"The Estimate of Base-collector Heterojunction Effect in SiGe base HBT", Mamoru Ugajin and Yoshihito Amemiya, NIT LSI Laboratories, Jan. 27, 1988.
Fahmy Wael
Hille Rolf
Rohm & Co., Ltd.
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