Heterodyne scatterometer for detecting and analyzing wafer surfa

Details Heterodyne scatterometer for detecting and analyzing wafer surfa Heterodyne scatterometer for detecting and analyzing wafer surfa

1997-09-04

1999-07-13

Turner, Samuel A.

Optics: measuring and testing

By particle light scattering

With photocell detection

356355, 3562375, G01B 902

Patent

active

059234237

ABSTRACT:
A scatterometer for detecting and analyzing wafer surface defects includes a light source generating a beam of light and a photodetector. Optics are used for splitting the beam of light into a reference beam and a detection beam. Optics also direct the reference beam and the detection beam to the photodetector through different optical paths. The optics direct the detection beam to the surface of the wafer and when incident upon a defect creates a scattered beam. The optics direct the scattered beam to the photodetector. A driver moves the surface of the wafer with respect to the detection beam. A computer coupled to the photodetector determines the presence of a defect on the surface by analyzing an interference pattern from the superposition of the reference beam and the scattered beam.

REFERENCES:
patent: 5241369 (1993-08-01), McNeil et al.
patent: 5486919 (1996-01-01), Tsuji et al.
patent: 5703692 (1997-12-01), McNeil et al.

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