Brushing – scrubbing – and general cleaning – Machines – Brushing
Patent
1996-08-01
1999-12-21
Chin, Randall E.
Brushing, scrubbing, and general cleaning
Machines
Brushing
15 211, 15 883, 198379, B08B 1102
Patent
active
060031859
ABSTRACT:
A method and apparatus for rotating wafers in a scrubber, wherein both sides of a wafer are scrubbed without slipping or hesitating. A rotating roller imparts rotary motion to a semiconductor wafer during a cleaning process wherein both sides of a wafer are scrubbed. The rotating roller and wafer contact at their outer edges and the friction between their outer edges causes the wafer to rotate. The roller has an outer edge with a groove. The wafer edge is pinched inside the groove to create enough friction that when cleaning solutions are applied the wafer does not slip and continues to rotate. Also, the groove allows the roller to pinch the wafer just enough so that when the roller reaches the flat of the wafer, the roller may regain the radius of the wafer without hesitating.
REFERENCES:
patent: 2646612 (1953-07-01), Shearer
patent: 3479222 (1969-11-01), David
patent: 3599306 (1971-08-01), Brafford
patent: 3937919 (1976-02-01), Clerx et al.
patent: 4483434 (1984-11-01), Miwa et al.
patent: 4705711 (1987-11-01), Perna
patent: 4826071 (1989-05-01), Becker
patent: 5028200 (1991-07-01), Shimane
patent: 5129876 (1992-07-01), Brabant et al.
patent: 5183378 (1993-02-01), Asano et al.
patent: 5188273 (1993-02-01), Schmoock
patent: 5391135 (1995-02-01), Kuroki et al.
patent: 5533243 (1996-07-01), Asano
patent: 5566466 (1996-10-01), Hearne
Drapak William G.
Krusell Wilbur C.
Saenz Albert M.
Thrasher David L.
Chin Randall E.
OnTrak Systems, Inc.
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