Helix coupled remote plasma source

Details Helix coupled remote plasma source Helix coupled remote plasma source

2007-02-27

2007-02-27

Paschall, Mark (Department: 3742)

Electric heating

Metal heating

By arc

C219S121410, C219S121480, C219S748000, C118S7230MW, C315S111210

Reexamination Certificate

active

10766973

ABSTRACT:
A remote plasma source employs a helical coil slow wave structure to couple microwave energy to a flowing gas to produce plasma for downstream substrate processing, such as photoresist stripping, ashing, or etching. The system also includes cooling structures for removing excess heat from the plasma source components.

REFERENCES:
patent: 4494039 (1985-01-01), Kim
patent: 5321222 (1994-06-01), Bible et al.
patent: 5412684 (1995-05-01), Schlie et al.
patent: 5534231 (1996-07-01), Savas
patent: 5811022 (1998-09-01), Savas
patent: 5841237 (1998-11-01), Alton
patent: 5841243 (1998-11-01), Hooper
patent: 5841244 (1998-11-01), Hamilton et al.
patent: 5964949 (1999-10-01), Savas
patent: 5983828 (1999-11-01), Savas
patent: 6208095 (2001-03-01), DiVergilio et al.
patent: 6225745 (2001-05-01), Srivastava
patent: 6263830 (2001-07-01), Kamarehi et al.
patent: 0 507 885 (1997-03-01), None
Liao, S. Y., Microwave Devices and Circuits, Prentice-Hall, Inc., Second Ed., Englewood Cliffs, New Jersey; pp. 150-154 and pp. 220-224.

Affiliated with

Also associated with

Rating

Helix coupled remote plasma source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Helix coupled remote plasma source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Helix coupled remote plasma source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3856746