Heating system for reaction chamber of chemical vapor deposition

Details Heating system for reaction chamber of chemical vapor deposition Heating system for reaction chamber of chemical vapor deposition

1987-06-18

1989-06-06

Pianalto, Bernard

Coating apparatus

Control means responsive to a randomly occurring sensed...

Temperature responsive

118 52, 118500, 118725, 427 55, 4272555, 427314, B05C 1100

Patent

active

048361380

ABSTRACT:
A heating system for use in chemical vapor deposition equipment of the type wherein a reactant gas is directed in a horizontal flow for depositing materials on a substrate which is supported in a reaction chamber on a susceptor which is rotatably driven for rotating the substrate about an axis which extends normally from its center. The heating system works in conjunction with a special heat sensing arrangement and includes an upper heating element assembly, a lower heating element assembly and a heat concentrator mechanism which interact to provide rapid temperature build-up at the beginning of a processing cycle, rapid temperature attenuation at the end of a processing cycle and a controlled flat temperature profile during the processig cycle.

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