Heating device for heating semiconductor wafers in thermal...

Details Heating device for heating semiconductor wafers in thermal... Heating device for heating semiconductor wafers in thermal...

2006-05-02

2006-05-02

Fuqua, Shawntina (Department: 3742)

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

C219S405000, C219S411000, C219S121600, C219S121740, C219S121820, C219S121660, C219S121780, C392S416000, C392S418000, C118S724000, C118S725000, C118S050100, C501S050000, C501S116000, C428S428000

Reexamination Certificate

active

07038174

ABSTRACT:
A novel apparatus for heat treating semiconductor wafers includes a heating device which comprises an assembly of light energy sources for emitting light energy onto a wafer. The light energy sources can be placed in various configurations. The tuning devices adjust the overall irradiance distribution of the light energy sources. The tuning devices can either be active sources of light energy or passive sources which reflect, refract, or absorb light energy. For instance, in one embodiment, the tuning devices can comprise a lamp spaced from a focusing lens designed to focus determined amounts of light energy onto a particular location of a wafer being heated.

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