Heating apparatus, heating method, and semiconductor device...

Details Heating apparatus, heating method, and semiconductor device... Heating apparatus, heating method, and semiconductor device...

2009-02-10

2011-10-04

Campbell, Thor (Department: 3742)

Electric resistance heating devices

Heating devices

Radiant heater

C392S407000

Reexamination Certificate

active

08032015

ABSTRACT:
A heating apparatus including a filament arranged in a vacuum heating vessel comprises a base plate arranged in the vacuum heating vessel to fix the filament at a predetermined position with respect to a conductive heater forming one surface of the vacuum heating vessel. The base plate comprises a plate body having a carbon fiber.

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Shibagaki, M., et al., “Development of the Novel Bombardment Anneal System (EBAS) for SiC Post Ion Implantation Anneal,” Materials Science Forum, vols. 483-485, p. 609-612 (2005).
Kimoto, T., et al., “Nitrogen Ion Implantation into α-SiC Epitaxial Layers,” Phys. Stat. Sol., vol. 162, p. 263-276 (1997).

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