Electric heating – Heating devices – Combined with container – enclosure – or support for material...
Patent
1998-09-03
2000-02-15
Jeffery, John A.
Electric heating
Heating devices
Combined with container, enclosure, or support for material...
392420, 118725, A21B 100, F21V 700, C23C 1600
Patent
active
060255757
ABSTRACT:
A heating apparatus for chemical vapor deposition equipment which is capable of providing a uniform temperature distribution, even for a wafer having a large surface area. The heating apparatus may include upper and lower reflection plates, with a heater located between the reflection plates. The apparatus may also include a barrier plate to help provide a uniform heat distribution and to minimize dust generation and metallic pollution on a wafer. The apparatus may also include a heater cover for covering the upper portions of the first reflection plate, the heater and the barrier plate, and the sides thereof. The upper reflection plate, which is installed above the heater cover, may be integrally formed with a gas spraying means.
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Kang Dong Hyun
Kim Chang Jae
Kim Jong Sik
Park In Jae
Park Seong Jae
Jeffery John A.
LG Semicon Co. Ltd.
Robinson Daniel
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