Heating and cooling apparatus for reaction chamber

Details Heating and cooling apparatus for reaction chamber Heating and cooling apparatus for reaction chamber

1996-11-27

1999-04-06

Paschall, Mark H.

Electric heating

Heating devices

With power supply and voltage or current regulation or...

21912143, 21912149, 118724, 20429809, B23K 1000

Patent

active

058922075

ABSTRACT:
The present invention relates to a temperature regulation apparatus capable of easily regulating the temperature of a support for a substance to be treated, such as a semiconductor wafer.
The temperature regulation apparatus includes a liquid nitrogen supply device for supplying liquid nitrogen into a temperature regulation space provided in the inside of a support so as to effect flashing of the liquid nitrogen. A heating device for heating the support and temperature sensors for detecting the temperature of the support are also provided. A temperature setting device sets the temperature of the support at a desired temperature and a controller controls the liquid nitrogen supply device and the heating device based on a temperature detected by the temperature sensors, so that the support reaches and is maintained at the set temperature.

REFERENCES:
patent: 3646243 (1972-02-01), Graneau et al.
patent: 3744935 (1973-07-01), Magni
patent: 4726195 (1988-02-01), Klee
patent: 4971653 (1990-11-01), Powell et al.
patent: 5376213 (1994-12-01), Ueda et al.
patent: 5414244 (1995-05-01), Imahashi
patent: 5584971 (1996-12-01), Komino
patent: 5589041 (1996-12-01), Lantsman
patent: 5591269 (1997-01-01), Arami et al.

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