Heated plate rapid thermal processor

Details Heated plate rapid thermal processor Heated plate rapid thermal processor

1991-10-23

1993-10-12

Reynolds, Bruce A.

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

118724, 118730, 392416, 392418, 432231, F27D 300, H01L 2122

Patent

active

052528073

ABSTRACT:
A rapid thermal processor for heat treating and cooling semiconductor material in an elongated process chamber having a base, side and top walls which enclose a heater plate assembly through which thin pins longitudinally move to carry workpieces vertically to and from the heater assembly. A cooling shutter is adapted in the chamber to shield the workpiece from the heater plate when the cooling process takes place. The chamber has gaseous ambient control means which regulates the type of atmosphere or vacuum in the chamber during heat processing of the workpieces.

REFERENCES:
patent: 3828722 (1974-08-01), Reuter
patent: 4507078 (1985-03-01), Tam et al.
patent: 5001327 (1991-03-01), Hirasawa
patent: 5034199 (1991-07-01), Zavracky et al.

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