Electric heating – Heating devices – With power supply and voltage or current regulation or...
Reexamination Certificate
2006-11-14
2006-11-14
Paschall, Mark (Department: 3742)
Electric heating
Heating devices
With power supply and voltage or current regulation or...
C219S494000, C392S416000, C118S725000, C438S795000
Reexamination Certificate
active
07135659
ABSTRACT:
Upon performing a heat treatment by heating a semiconductor wafer positioned inside a reaction vessel with a heater provided outside the reaction vessel and supplying a processing gas into the reaction vessel, to increase the temperature inside the reaction vessel promptly to reach a processing temperature to be stabilized after the wafer is carried into the reaction vessel, and to reduce the burden to the operator caused in the heating control adjustment.The internal temperature inside the reaction vessel and the external temperature as a heater temperature are interpolated at a predetermined mixing ratio, and a first computing unit and a second computing unit are provided so that, in the heating process, the output value of the first computing unit is used firstly, and the output value of the second computing unit is interpolated intermediately while the interpolation ratio of the output value of the second computing unit gradually increases, and the output value of the second computing unit is used 100% finally, said first computing unit obtaining output values that correspond to the deviations between the interpolated values and a preset temperature values, said second computing unit functioning as a cascade control unit by obtaining the internal temperature through the major loop and the internal temperature through the minor loop.
REFERENCES:
patent: 6793734 (2004-09-01), Takagi
patent: 2003/0045961 (2003-03-01), Nakao
patent: 2004/0053516 (2004-03-01), Nakada et al.
patent: 56-085101 (1981-07-01), None
patent: 8-288230 (1996-11-01), None
Paschall Mark
Smith , Gambrell & Russell, LLP
Tokyo Electron Limited
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