Heat treatment method

Details Heat treatment method Heat treatment method

2006-10-10

2006-10-10

Chen, Bret (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

C427S255280, C118S725000

Reexamination Certificate

active

07118780

ABSTRACT:
A method of manufacturing a semiconductor device comprising: supplying a gas from an upstream side of a reaction chamber; heating the gas by using heat treatment means located on the upstream of the reaction chamber, and making the gas flow downstream; and heating a substrate to be processed arranged on a downstream side of the reaction chamber while circulating the gas from the downstream side of the reaction chamber to the upstream side.

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