Heat treatment apparatus of light-emission type and method...

Electric resistance heating devices – Heating devices – Radiant heater

Reexamination Certificate

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Details

C392S418000, C219S390000, C219S405000, C219S411000, C118S724000, C118S725000, C118S050100

Reexamination Certificate

active

07068926

ABSTRACT:
After the maintenance of a heat treatment apparatus, a susceptor and a heating plate are moved upwardly and a nitrogen gas flow from an inlet toward an outlet passage is produced prior to heat treating a semiconductor wafer. In this state, flash lamps are turned on to cause momentary expansion and contraction of the gas in a chamber, thereby scattering particles deposited on a bottom plate, etc. The scattered particles are removed by the nitrogen gas passing through a bottom portion of the chamber and discharged through the outlet passage. The particles are easily removed due to the flash lamps being turned on a predetermined number of times at fixed time intervals while folowing the nitrogen gas. The heat treatment apparatus has a light-emission characteristic and easily removes the particles in the chamber.

REFERENCES:
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patent: 4649261 (1987-03-01), Sheets
patent: 6856763 (2005-02-01), Allen et al.
patent: 9-17705 (1977-01-01), None
patent: 57-162340 (1982-10-01), None
patent: 59-169125 (1984-09-01), None
patent: 60-258928 (1985-12-01), None
patent: 63-166219 (1988-07-01), None
patent: 7-230954 (1995-08-01), None
patent: 7-321046 (1995-12-01), None
patent: 2001-237195 (2001-08-01), None

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