Electric resistance heating devices – Heating devices – Radiant heater
Patent
1995-05-26
1999-03-02
Walberg, Teresa J.
Electric resistance heating devices
Heating devices
Radiant heater
219390, 118725, 118 501, C23L 1600
Patent
active
058781919
ABSTRACT:
A heat treatment apparatus for semiconductor wafers includes a reaction chamber, a heater, a heat-insulating member, a first cooling gas path, a second cooling gas path, a blower and a controller. The reaction chamber houses semiconductor wafers. The heater is provided outside the reaction chamber to heat it. The heat-insulating member is provided outside the heater to keep the temperature of the reaction chamber. The first cooling gas path is interposed between the reaction chamber and heater, while the second cooling gas path is disposed between the heater and heat-insulating member. The blower allows gas to flow through the first and second gas paths to cool the reaction chamber. The controller controls the heater to increase the temperature of the reaction chamber and does the blower to decrease the temperature thereof.
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Doi Kenji
Katakabe Ichiro
Kawamoto Hiroshi
Miyashita Naoto
Okuda Tsuyoshi
Kabushiki Kaisha Toshiba
Pelham J.
Walberg Teresa J.
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