Photography – Fluid-treating apparatus – Fluid application to one side only of photographic medium
Reexamination Certificate
2007-03-30
2010-02-23
Mathews, Alan A (Department: 2882)
Photography
Fluid-treating apparatus
Fluid application to one side only of photographic medium
C430S330000, C118S733000
Reexamination Certificate
active
07665917
ABSTRACT:
Apparatus and methods for heating a substrate in a pressurized environment inside of a thermal processing system. The substrate is placed in a gaseous environment inside a processing chamber of the thermal processing system. The substrate is supported in the gaseous environment. The gas pressure inside the processing chamber is increased above atmospheric pressure, which increases the temperature of the gaseous environment. Heat is transferred from the pressurized gaseous environment to the substrate for thermally processing a layer on the substrate.
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Gail Kaplan Verbitsky, Examiner, USPTO, Office Action issued in related U.S. Appl. No. 11/833,038 dated as mailed Jul. 10, 2009.
Mathews Alan A
Tokyo Electron Limited
Wood Herron & Evans LLP
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