Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Reexamination Certificate
2007-08-14
2007-08-14
Padgett, Marianne (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
C427S557000, C438S795000
Reexamination Certificate
active
10290435
ABSTRACT:
A heat diffusion plate and a heating plate are placed in a heat treatment chamber in this order. The heating plate is used for preliminarily heating a glass substrate to a temperature in a range from 200° C. to 400° C. The glass substrate thus preliminarily heated is subjected to a heat treatment by flash light irradiation by a xenon flash lamp. The flash light irradiation makes it possible to uniformly heat an amorphous silicon film on the glass substrate, and consequently to be poly-crystallized. Thus, it becomes possible to provide a heat treatment technique capable of carrying out a uniform heat treatment on the silicon film on the glass substrate sufficiently.
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Dainippon Screen Mfg. Co,. Ltd.
Ostrolenk Faber Gerb & Soffen, LLP
Padgett Marianne
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