Electric resistance heating devices – Heating devices – Radiant heater
Reexamination Certificate
2005-09-06
2005-09-06
Fuqua, Shawntina (Department: 3742)
Electric resistance heating devices
Heating devices
Radiant heater
C392S418000, C392S423000, C392S424000, C219S390000, C219S405000, C219S411000, C118S724000, C118S725000
Reexamination Certificate
active
06941063
ABSTRACT:
A method involves pre-heating a workpiece to an intermediate temperature, heating a surface of the workpiece to a desired temperature greater than the intermediate temperature, and enhancing cooling of the workpiece. Enhancing cooling may involve absorbing radiation thermally emitted by the workpiece. An apparatus includes a first heating source for heating a first surface of a semiconductor wafer, a second heating source for heating a second surface of the semiconductor wafer, and a first cooled window disposed between the first heating source and the semiconductor wafer.
REFERENCES:
patent: 1587023 (1926-06-01), Mottlau
patent: RE24296 (1957-03-01), Stewart
patent: 2981819 (1961-04-01), Gregory
patent: 3047438 (1962-07-01), Marinace
patent: 3108713 (1963-10-01), Barrett et al.
patent: 3160517 (1964-12-01), Jenkin
patent: 3188459 (1965-06-01), Bridwell
patent: 3227065 (1966-01-01), Litman
patent: 3239651 (1966-03-01), Silberman
patent: 3240915 (1966-03-01), Carter et al.
patent: 3460510 (1969-08-01), Currin
patent: 3502516 (1970-03-01), Henker
patent: 3623712 (1971-11-01), McNeilly et al.
patent: 3627590 (1971-12-01), Mammel
patent: 3661637 (1972-05-01), Sirtl
patent: 3692572 (1972-09-01), Strehlow
patent: 3836751 (1974-09-01), Anderson
patent: 3913872 (1975-10-01), Weber
patent: 4041278 (1977-08-01), Boah
patent: 4081313 (1978-03-01), McNeilly et al.
patent: 4097226 (1978-06-01), Erikson et al.
patent: 4101759 (1978-07-01), Anthony et al.
patent: 4115163 (1978-09-01), Gorina et al.
patent: 4151008 (1979-04-01), Kirkpatrick
patent: 4164643 (1979-08-01), Peart et al.
patent: 4220483 (1980-09-01), Cazcarra
patent: 4224096 (1980-09-01), Osborne
patent: 4233493 (1980-11-01), Nath
patent: 4308078 (1981-12-01), Cook
patent: 4315130 (1982-02-01), Inagaki et al.
patent: 4325006 (1982-04-01), Morton
patent: 4331485 (1982-05-01), Gat
patent: 4370175 (1983-01-01), Levatter
patent: 4375993 (1983-03-01), Mori et al.
patent: 4379727 (1983-04-01), Hansen et al.
patent: 4398094 (1983-08-01), Hiramoto
patent: 4421048 (1983-12-01), Adema et al.
patent: 4431459 (1984-02-01), Teng
patent: 4455479 (1984-06-01), Itoh et al.
patent: 4493977 (1985-01-01), Arai et al.
patent: 4533820 (1985-08-01), Shimizu
patent: 4539431 (1985-09-01), Moddel et al.
patent: 4540876 (1985-09-01), McGinty
patent: 4550245 (1985-10-01), Arai et al.
patent: 4550684 (1985-11-01), Mahawili
patent: 4567352 (1986-01-01), Mimura et al.
patent: 4649261 (1987-03-01), Sheets
patent: 4680447 (1987-07-01), Mahawili
patent: 4698486 (1987-10-01), Sheets
patent: 5219786 (1993-06-01), Noguchi
patent: 5336641 (1994-08-01), Fair et al.
patent: 5359693 (1994-10-01), Nenyei et al.
patent: 5399506 (1995-03-01), Tsukamoto
patent: 5446825 (1995-08-01), Moslehi et al.
patent: 5561735 (1996-10-01), Camm
patent: 5628564 (1997-05-01), Nenyei et al.
patent: 5727017 (1998-03-01), Maurer et al.
patent: 5777437 (1998-07-01), Neister
patent: 5841110 (1998-11-01), Nenyei et al.
patent: 5908307 (1999-06-01), Talwar et al.
patent: 5960158 (1999-09-01), Gat et al.
patent: 5971565 (1999-10-01), Zapata et al.
patent: 6051483 (2000-04-01), Lee et al.
patent: 6066516 (2000-05-01), Miyasaka
patent: 6187616 (2001-02-01), Gyoda
patent: 6293696 (2001-09-01), Guardado
patent: 6303411 (2001-10-01), Camm et al.
patent: 2004/0105670 (2004-06-01), Kusuda et al.
patent: 2004/0112890 (2004-06-01), Kusuda et al.
patent: 0 105 230 (1984-04-01), None
patent: 0 399 662 (1990-11-01), None
patent: 0 538 874 (1993-04-01), None
patent: 0 598 409 (1994-05-01), None
patent: 938699 (1960-12-01), None
patent: 2065973 (1981-07-01), None
patent: 2 199 693 (1988-07-01), None
patent: 55-115327 (1980-09-01), None
patent: 56-48128 (1981-05-01), None
patent: 0080729 (1982-05-01), None
patent: 57-208146 (1982-12-01), None
patent: 58-070536 (1983-04-01), None
patent: 58-106836 (1983-06-01), None
patent: 59-211221 (1984-11-01), None
patent: 01-246828 (1989-10-01), None
patent: 02294027 (1990-05-01), None
patent: 04-355911 (1992-12-01), None
patent: 07-245274 (1995-09-01), None
patent: 08-107113 (1996-04-01), None
patent: 32864 (1921-08-01), None
patent: WO 99/41777 (1999-08-01), None
patent: WO 00/67298 (2000-11-01), None
J. Lue, “Arc Annealing of BF+2 Implanted Silicon by a Short Pulse Flash Lamp,” Appl. Phys. Lett., vol. 36, No. 1, pp. 73-76, dated Jan. 1, 1980.
M. Lefrancois and D. Camm, “Temperature Uniformity During Impulse™Anneal,” 8thInternational Conference on Advanced Thermal Processing of Semiconductors, RTP 2000, pp. 1-6, dated Sep. 20-22, 2000.
A.T. Fiory, K.K. Bourdelle, P.K. roy and S.P. McCoy, “Spike Annealing of Implanted PMOS Gates,” Proc. of RTP 2000 Conference, pp. 1-8, dated Sep. 20-22, 2000.
D.M. Camm and B. Lojek, “High Power Arc Lamp RTP System for High Temperature Annealing Applications,” 2ndInternational Rapid Thermal Conference, pp. 1-7, (1994).
A.T. Fiory, K.K. Bourdelle, M.E. Lefrancois, D.M. Camm and A. Agarwal., “Electrical Measurements of Annealed Boron Implants for Shallow Junctions,” Advances in Rapid Thermal Processing, vol. 99-10, pp. 133-140, (1999).
D.M. Camm and M. Lefrancois, “Spike Thermal Processing Using Arc Lamps,” Advances in Rapid Thermal Processing, (2000).
A.T. Fiory, D.M. Camm, M.E. Lefrancois, S.P. McCoy and A. Agarwal, “Annealing Ultra-Low Energy Boron Implants with an Arc Lamp System,” RTP 1999, pp. 273-280 (1999).
Semiconductor Industry Association, “International Technology Roadmap for Semiconductors,” International Sematech, Austin Texas, pp. 7, 14, pp. 123-131, (1999).
“Products, Capabilities,” Temarach Scientific Co., Inc.
“Searchlight Model-100,” Tamarack Scientific Co., Inc.
A.R. Lunde, “Nasa Tech Brief,” B75-1008, Lewis Research Center, dated Apr. 1975.
“Transient Calorimeter Calibration System,” AFFDL-TR-75-24, Tamarack Scientific Company, Orange, California, pp. 1-50, dated Mar. 1975.
N.S. Kapany, J.A. Eyer and R.E. Keim, “Fiber Optics. Part II. Image Transfer on Static and Dynamic Scanning with Fiber Bundles,” Journal of the Optical Society of America, vol. 47, No. 5, pp. 423-427, dated May 1957.
R. J. Potter, “Transmission Properties of Optical Fibers,” Journal of the Optical Society of America, vol. 51, No. 10, pp. 1079-1089, dated Oct. 1961.
D. E. Williamson, “Cone Channel Condenser Optics,” Journal of the Optical Society of America, vol. 42, No. 10, pp. 712-715, dated Oct. 1952.
R.L. Cohen, J.S. Williams, L.C. Feldman and K.W. West, Thermally Assisted Flash Annealing of Silicon and Germanium, Bell Laboratories, Murray Hill, New Jersey, pp. 1-4.
R.J. von Gutfeld, “Crystallization of Silicon for Solar Cell Applications,” IBM Technical Disclosure, vol. 19, IBM Corp., pp. 3955-3956, dated Mar. 1977.
T.O. Sedgwick, “Short Time Annealing,” J. Electrochem. Soc., vol. 130, No. 2, pp. 484-492, dated Feb. 1983.
P. S. Burggraaf, “Rapid Wafer Heating: Status 1983,” Semiconductor International, pp. 69-74, dated Dec. 1983.
A. Gat and S. Shatas, “Introduction to Heatpulse™Processing Technology,” AG Associates, Moutain View, California, pp. 1-29.
J. C. Gelpey and P. O. Stump, “Rapid Optical Annealing Using the Water-Wall DC Arc Lamp,” Microelectronic Manufacturing and Testing, pp. 22-24, dated Aug. 1983.
M.M. Chen, J.B. Berkowitz-Mattuck and P.E. Glaser, “The Use of a Kaleidoscope to Obtain Uniform Flux Over a Large Area in a Solar or Arc Imaging Furnace,” Applied Optics, vol. 2, No. 3, pp. 265-271, dated Mar. 1983.
R. Klabes, J. Matthai, M. Voelskow and S. Mutze, “Pulsed Incoherent Light Annealing of Arsenic and Phosphorous Implanted Polycrystalline Silicone,” Physica Status Solidi, pp. K5-7, K9-12 (1982).
A. Lietoila, R.B. Gold and J.F. Gibbons, “Temperature Rise Induced in Si by Continuous Xenon Arc Lamp Radiation,” American Institute of Physics, vol. 53, No. 2, pp. 1169-1172, dated Feb. 1982.
R.A. Powell and
Camm David Malcolm
Elliott J. Kiefer
Fuqua Shawntina
Knobbe Martens Olson & Bear LLP
Mattson Technology Canada, Inc.
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