Coating apparatus – Gas or vapor deposition – With treating means
Patent
1993-10-13
1996-07-30
Wilczewski, Mary
Coating apparatus
Gas or vapor deposition
With treating means
118726, C23C 1600
Patent
active
055407820
ABSTRACT:
A heat-treating apparatus for heat treating a plurality of objects-to-be-treated (semiconductor wafers) by loading the objects-to-be-treated into a heat treatment vessel having the lower end opened, mounted on a heat-treatment boat vertically spaced from each other, and sealing the opened end includes a heat insulator disposed on the lower end portion of the heat-treatment boat for heat-insulating the interior of the reaction vessel. The heat-insulator includes heat transmission preventing plates of opaque quartz for preventing the transmission of heat rays from a heater, and a support for supporting the heat transmission preventing plates. Thus sufficient heat-insulating effect for a heat-treating operation can be achieved, and stable heat-treatment can be conducted without impairing the function of sealing the heat-insulating unit. Furthermore, particle formation can be prevented, with a result of improved yields of the heat-treatment.
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Miyagi Katsushin
Yamahara Miyuki
Dutton Brian K.
Tokyo Electron Kabushiki Kaisha
Tokyo Electron Tohoku Kabushiki Kaisha
Wilczewski Mary
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