Coating apparatus – Gas or vapor deposition – With treating means
Patent
1997-01-13
1997-12-16
Niebling, John
Coating apparatus
Gas or vapor deposition
With treating means
118723ER, 156345, C23C 1600
Patent
active
056980353
ABSTRACT:
A heat-resistive electrode material substantially consisting of 40 to 60 wt % of at least one of ZrB.sub.2 and TiB.sub.2, 20 to 50 wt % of BN, and not more than 30 wt % of AlN is disclosed. This heat-resistive electrode material is used in at least portions of electrodes of an apparatus having a plasma generating unit, e.g., an ion source, a plasma etching apparatus, or a plasma CVD apparatus, that contacts a plasma.
Hirashima Yutaka
Isozaki Kei
Koshiishi Akira
Matsudo Masahiko
Chang Joni Y.
Denki Kagaku Kogyo Kabushiki Kaisha
Niebling John
Tokyo Electron Limited
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