Heat processing apparatus for semiconductor manufacturing

Details Heat processing apparatus for semiconductor manufacturing Heat processing apparatus for semiconductor manufacturing

1987-04-10

1989-02-14

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118724, 118 50, 118 501, C23C 1600

Patent

active

048039489

ABSTRACT:
A heat processing apparatus for manufacturing semiconductors is constructed such that an airtightly sealing part is provided at the tubular end having equal diameter to that of a main body of the apparatus, a ring shaped packing is wound on the outer circumference of a cylindrical tube adjacent to the end to be pressed between a pair of ring bodies which are formed with tapered edges of opposite inner sides, an inner tube having an equal diameter to that of the tube is connected with the end of the cylindrical tube through a cushioning material, on the outer circumference of the inner tube an outer tube is constructed integrally with one of the ring bodies, opening ends of both the inner and the outer tubes are adapted to be closed with a lid, and to the outer tube there are provided an exhausting tube for exhausting gas in the cylindrical tube and a gas introducing tube which interrupts an open air from the cylindrical tube with the flow of inert gas which flows when the lid is opened, and exhausting holes which connect with the exhausting tube and a plurality lines of gas holes for forming "gas curtain" are provided to the inner tube.

REFERENCES:
patent: 4449037 (1984-05-01), Shibamata
patent: 4487161 (1984-12-01), Hirata
patent: 4640223 (1987-02-01), Dozier

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