Heat processing apparatus and heat processing method

Electric heating – Heating devices – Combined with container – enclosure – or support for material...

Reexamination Certificate

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C392S416000, C118S724000

Reexamination Certificate

active

07601933

ABSTRACT:
A heat processing device that bakes a substrate having a resist coating film containing a volatile substance, includes a hot plate2, a hot plate temperature control unit3, a box member1a, 5, 32that defines a heat space30and a fluid space31, air supply unit18, 18A and suction unit10, 10A that create an air current flowing in a horizontal direction in the fluid space31, and a controller22, 22A that controls the hot plate temperature control unit3, the air supply unit18, 18A, suction unit10, 10A and the gas temperature control unit19so that a relationship of TF<TH≦TS≦TP is satisfied where TP represents a temperature of the hot plate, TS represents an upper surface temperature of the substrate W, TH represents a temperature of the heat space and TF represents a temperature of the fluid space.

REFERENCES:
patent: 6097005 (2000-08-01), Akimoto
patent: 6222161 (2001-04-01), Shirakawa et al.
patent: 6246030 (2001-06-01), Matsuyama
patent: 2002/0086259 (2002-07-01), Shirakawa et al.
patent: 2002/0123011 (2002-09-01), Kawano et al.
patent: 61-89632 (1986-05-01), None
patent: 6-84782 (1994-03-01), None
patent: 11-204391 (1999-07-01), None
patent: 11-204417 (1999-07-01), None
patent: 2002-8967 (2002-01-01), None
patent: 2002-228375 (2002-08-01), None
patent: 2002-289513 (2002-10-01), None
patent: 2002-359175 (2002-12-01), None

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