Heat pipe susceptor for epitaxy

Details Heat pipe susceptor for epitaxy Heat pipe susceptor for epitaxy

1989-10-30

1992-08-11

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118728, 118730, C23C 1600

Patent

active

051369788

ABSTRACT:
The present invention is a heat pipe susceptor for use in a vapor deposition system. The multi-layered refractory material susceptor provides a highly uniform heated surface upon which wafers are placed for heating by a radio frequency (RF) source. Because of the highly uniform surface temperature, susceptors are able to hold a plurality of inch sized diameter wafers and the shape of the surfaces can be designed as the need arises. A cylindrically shaped top and a multi-faced frustum shaped top are examples.

REFERENCES:
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patent: 4147571 (1979-04-01), Stringfellow
patent: 4419332 (1983-12-01), von der Ropp
patent: 4534312 (1985-08-01), Shinya
patent: 4596208 (1986-06-01), Wolfson
patent: 4681995 (1987-07-01), Ahern
patent: 4736705 (1988-04-01), Weyburne
patent: 4778559 (1988-10-01), McNeilly
patent: 4788416 (1988-11-01), Price
patent: 4789771 (1988-12-01), Robinson
patent: 4811687 (1989-03-01), Prince
patent: 4821674 (1989-04-01), de Boer
patent: 4834022 (1989-05-01), Mahawilli

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