Heat generating resistive element, substrate for liquid...

Details Heat generating resistive element, substrate for liquid... Heat generating resistive element, substrate for liquid...

2007-01-02

2007-01-02

Stephens, Juanita D. (Department: 2853)

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C347S056000

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11001014

ABSTRACT:
A heat generating resistive element which is used in a liquid discharge head for discharging a liquid from a discharge port by thermal energy, comprises a composition ratio of 15–30 at% Fe, 35–60 at% Si, and 10–50 at% N, in total to 100 at% or substantially 100 at%.

REFERENCES:
patent: 4723129 (1988-02-01), Endo et al.
patent: 4740796 (1988-04-01), Endo et al.
patent: 6375312 (2002-04-01), Ikeda et al.
patent: 6964471 (2005-11-01), Tamura et al.
patent: 2005/0122379 (2005-06-01), Suzuki et al.
patent: 7-125218 (1995-05-01), None

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