Incremental printing of symbolic information – Ink jet – Ejector mechanism
Reexamination Certificate
2006-06-06
2006-06-06
Tran, Huan (Department: 2861)
Incremental printing of symbolic information
Ink jet
Ejector mechanism
Reexamination Certificate
active
07055937
ABSTRACT:
The invention provides a heat generating resistant element having a high durability and a high resistance suitable for constituting an electrothermal converting member in an ink jet head or an ink jet apparatus. There is employed, as the heat generating resistant element, a film constituted of Cr, Si and N, having a composition of Cr: 15 to 20 at. %, Si: 40 to 60 at. % and N: 20 to 45 at. %, which constitute 100 at. % or substantially 100 at. %.
REFERENCES:
patent: 4392992 (1983-07-01), Paulson et al.
patent: 4429321 (1984-01-01), Matsumoto
patent: 4510178 (1985-04-01), Paulson et al.
patent: 4591821 (1986-05-01), Paulson et al.
patent: 4723129 (1988-02-01), Endo et al.
patent: 4740796 (1988-04-01), Endo et al.
patent: 4907015 (1990-03-01), Kaneko et al.
patent: 5066963 (1991-11-01), Kimura et al.
patent: 5503878 (1996-04-01), Suzuki et al.
patent: 6287933 (2001-09-01), Iida et al.
patent: 6336713 (2002-01-01), Regan et al.
patent: 6527813 (2003-03-01), Saito et al.
patent: 6530650 (2003-03-01), Ozaki et al.
patent: 6663228 (2003-12-01), Saito et al.
patent: 10-114071 (1998-05-01), None
Hayakawa Yukihiro
Kawasaki Yoshinori
Saito Ichiro
Sakai Toshiyasu
Suzuki Hiroyuki
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Tran Huan
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