Receptacles – End wall structure – Joint or seam between sidewall and end wall
Patent
1997-09-03
1999-02-23
Moy, Joseph M.
Receptacles
End wall structure
Joint or seam between sidewall and end wall
B65D 822
Patent
active
058734856
ABSTRACT:
An apparatus and method for producing a tank for a heat exchanger. The apparatus includes molds which form the tank such that it has an open end, an annular skirt about the entire periphery of the open end, and an annular groove in the annular skirt. A space in the molds receives the skirt, and a projection on one of the molds urges the outer and inner side surfaces of the skirt toward each other after a resin has been injected into the annular groove. A guide surface extends from the bottom of the projection to a position substantially even with a bottom surface of the annular groove to govern the amount of deformation of the side surface which is urged by the projection. A bubble removal element, such as a protuberance or groove, is formed in the annular groove at a position where opposite ends of the resin impinge on each other when injected from an injection gate, to prevent bubbles from forming in the resin.
REFERENCES:
patent: 3108710 (1963-10-01), Langg et al.
patent: 5008060 (1991-04-01), Kanai et al.
patent: 5165566 (1992-11-01), Linner
patent: 5199593 (1993-04-01), Kita
patent: 5246065 (1993-09-01), Huff
patent: 5263606 (1993-11-01), Dutt et al.
patent: 5346096 (1994-09-01), Diersch et al.
patent: 5353953 (1994-10-01), Sakaemura
patent: 5427268 (1995-06-01), Downing, Jr. et al.
Kusama Seiichi
Yamazaki Hisarou
Calsonic Corporation
Moy Joseph M.
LandOfFree
Heat exchanger tank and method of producing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Heat exchanger tank and method of producing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Heat exchanger tank and method of producing the same will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-299591