Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Including heat exchanger for reaction chamber or reactants...
Reexamination Certificate
2003-04-04
2008-05-27
Corcoran, Gladys J P (Department: 1797)
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Including heat exchanger for reaction chamber or reactants...
C422S129000, C165S157000
Reexamination Certificate
active
07378065
ABSTRACT:
A heat exchange unit for axial and radial pseudo-isothermal reactors which comprise a substantially cylindrical shell (2) closed at the opposite ends by base plates (3, 4), a reaction zone (6) containing a catalytic bed and at least one heat exchanger (11) of the type with a plate having a variable section along the direction of the flow of operating heat exchange fluid.
REFERENCES:
patent: 2262158 (1941-11-01), Beam
patent: 5031692 (1991-07-01), Kehrer et al.
patent: 5035867 (1991-07-01), Dang Vu et al.
patent: 5405586 (1995-04-01), Koves
patent: 2002/0088613 (2002-07-01), Filippi et al.
patent: 2002/0161243 (2002-10-01), Zehner et al.
patent: 100 31 347 (2001-01-01), None
patent: 1 153 653 (2001-11-01), None
patent: 1 306 126 (2003-05-01), None
patent: WO-95/01834 (1995-01-01), None
Dictionary definition of “Box” , see The American Heritage® Dictionary of the English Language, Fourth Edition Copyright © 2007, 2000 by Houghton Mifflin Company. Updated in 2007. Published by Houghton Mifflin Company. All rights reserved. More from Dictionary.
Filippi Ermanno
Rizzi Enrico
Tarozzo Mirco
Akerman & Senterfitt
Conley Sean E.
Corcoran Gladys J P
Methanol Casale S.A.
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