Heat-developable photosensitive material with antihalation layer

Details Heat-developable photosensitive material with antihalation layer Heat-developable photosensitive material with antihalation layer

1981-10-19

1983-03-08

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Antihalation or filter layer containing

430513, 430517, 430522, 430618, 430518, G03C 174

Patent

active

043761623

ABSTRACT:
A heat-developable photosensitive material is disclosed having a high image sharpness. The material is comprised of a heat-developable photosensitive layer which includes an organic silver salt, a photocatalyst, and a reducing agent. An antihalation layer is provided on the opposite face of the material with respect to the side intended for imagewise exposure. The antihalation layer contains a photosensitive halogen-containing compound which reduces the pH of the antihalation layer by photolysis and is colored with a dye which causes a change of color when the pH of the antihalation layer is reduced.

REFERENCES:
patent: 3988154 (1976-10-01), Sturmer
patent: 4081278 (1978-03-01), Dedinas et al.
patent: 4201590 (1980-05-01), Levinson et al.
patent: 4272106 (1981-06-01), Auger

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