Heat-developable photosensitive material and heat-developing...

Details Heat-developable photosensitive material and heat-developing... Heat-developable photosensitive material and heat-developing...

2006-09-05

2006-09-05

Chea, Thorl (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Thermographic process

Heat applied after imaging

Reexamination Certificate

active

07101658

ABSTRACT:
A heat-developable photosensitive material includes at least a photosensitive silver halide particle, a nonphotonsensitive organic silver salt, a developing accelerator, a reducing agent and a binder on a support, wherein the photosensitive silver halide includes silver iodide at 5 mol % to 100 mol % and the average particle size of the photosensitive silver halide is 5 nm to 80 nm. A heat developing method for the heat-developable photosensitive material is also disclosed.

REFERENCES:
patent: 2910377 (1959-10-01), Owen
patent: 3152904 (1964-10-01), Sorensen et al.
patent: 3457075 (1969-07-01), Morgan et al.
patent: 3801321 (1974-04-01), Evan et al.
patent: 4332889 (1982-06-01), Siga et al.
patent: 4395484 (1983-07-01), McCarney
patent: 5656419 (1997-08-01), Toya et al.
patent: 5998126 (1999-12-01), Toya et al.
patent: 6090538 (2000-07-01), Arai et al.
patent: 6143488 (2000-11-01), Uytterhoeven et al.
patent: 6156491 (2000-12-01), Goto
patent: 6165705 (2000-12-01), Dankosh et al.
patent: 6210869 (2001-04-01), Ito
patent: 6395466 (2002-05-01), Katoh et al.
patent: 6413712 (2002-07-01), Yoshioka et al.
patent: 6482583 (2002-11-01), Ikari
patent: 6645714 (2003-11-01), Oya et al.
patent: 0 922 955 (1999-06-01), None
patent: 43-4924 (1968-02-01), None
patent: 8-297345 (1996-11-01), None
patent: 2785129 (1998-05-01), None
patent: 2000292886 (2000-10-01), None
patent: 2001-42472 (2001-02-01), None
patent: 2001092075 (2001-04-01), None
patent: WO 97/48014 (1997-12-01), None
patent: WO 97/48015 (1997-12-01), None

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