Heat developable photosensitive material

Details Heat developable photosensitive material Heat developable photosensitive material

1980-02-15

1981-09-22

Louie, Jr., Won H.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

430618, 430619, 430620, 430964, 430536, 430961, G03C 102

Patent

active

042911206

ABSTRACT:
A heat developable photosensitive material having two or more layers superimposed on a support and containing at least (a) an organic silver salt, (b) a photocatalyst and (c) a reducing agent in one or more such layers, at least one said layers containing (d) a polymer having a repeating unit of the formula: ##STR1## wherein R is a hydrogen atom or a lower alkyl group; and X is a hydrogen atom, or one to three groups selected from the group consisting of a halogen atom, a nitro group, a cyano group, an alkyl group, an alkoxy group, an alkoxycarbonyl group, an alkylsulfonyl group, an aryloxy group, an acyl group, an acyloxy group and an acylamido group.

REFERENCES:
patent: 3877942 (1975-04-01), Nagatomo et al.

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