Heat developable photosensitive material

Details Heat developable photosensitive material Heat developable photosensitive material

1991-03-05

1992-01-21

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Thermographic process

Heat applied after imaging

430203, 430351, 430611, 430617, G03C 554, G03C 134

Patent

active

050827634

ABSTRACT:
A heat developable photosensitive material comprising a support having thereon at least one photosensitive silver halide emulsion layer, which contains at least one compound selected from those represented by the following general formulae (I) and (II) to acquire a high S/N ratio and high sensitivity: ##STR1## wherein R represents an alkylene group, an alkenylene group, an aralkylene group or an arylene group, which each may be substituted; Y represents ##STR2## R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7, R.sub.8, R.sub.9 and R.sub.10 each represents a hydrogen atom, or a substituted or unsubstituted alkyl, aryl, alkenyl or aralkyl group; X represents ##STR3## R' represents a hydrogen atom, or a substituted or unsubstituted alkyl or alkenyl group; R" represents a hydrogen atom, or a substitutive group therefor; M represents a hydrogen atom, an alkali metal ion, an ammonium group, or a group capable of being cleaved under an alkaline condition; n represents 0 or 1; m represents 1 or 2; l represents 4-m; Z represents a substituted or unsubstituted amino, quaternary ammonium, sulfonyl, carbamoyl, sulfamoyl, carbonamido, sulfonamido, ureido, alkylthio, alkoxy or heterocyclic group; X' represents --O--, --S--S, or --NH--; Y' represents ##STR4## R.sub.11, R.sub.12, R.sub.13, R.sub.14, R.sub.15, R.sub.16, R.sub.17 and R.sub.18 each has the same meaning as R.sub.1 to R.sub.10.

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