Heat-developable light-sensitive material with polymeric base pr

Details Heat-developable light-sensitive material with polymeric base pr Heat-developable light-sensitive material with polymeric base pr

1985-07-30

1986-06-17

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified radiation sensitive composition with color...

430203, 430495, 430617, 430619, 430955, G03C 140, G03C 106

Patent

active

045956529

ABSTRACT:
A heat-developable light-sensitive material is described, characterized by containing a polymer having a functional group releasing a basic component upon thermal decomposition in the side chain thereof. This polymer is a new base precursor which when added to heat-developable light-sensitive materials increases their storage stability and permits them to form an image of high density and decreased in fog even after storage. Preferred examples of such polymers are polymers having a repeating unit represented by the general formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are each a univalent group, L is a divalent connecting group having from 1 to 20 carbon atoms, M is a cation and x is a number equivalent with the valence of M.

REFERENCES:
patent: 4060420 (1977-11-01), Merkel et al.
patent: 4088496 (1978-05-01), Merkel
patent: 4473631 (1984-09-01), Hirai et al.
Arcesi et al., "Aminimides . . . Elements", Research Disclosure No. 15733, 5/1977 pp. 60,61.
DeSelms et al., "Base Generating Aminimides . . . ", Research Disclosure No. 15776, 5/1977, pp. 67+68.
Wilson, "Polymeric Aminimides . . . ", Research Disclosure No. 15732, 5/1977, p. 43.
Carpenter et al., "Photothermographic Silver Halide Systems", Research Disclosure No. 17029, pp. 9-15, 6/1978.

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