Heat developable light-sensitive material

Details Heat developable light-sensitive material Heat developable light-sensitive material

1975-05-19

1977-06-21

Herbert, Jr., Thomas J.

Gas separation: apparatus

Solid sorbent apparatus

With control means responsive to sensed condition

96 68, 96 76R, 961146, G03C 102

Patent

active

040309312

ABSTRACT:
A heat developable light-sensitive material comprising a support having thereon or therein at least (a) an organic silver salt, (b) a light-sensitive silver halide or a light-sensitive silver halide-forming component and (c) as a reducing agent at least one ester selected from the group consisting of (1) esters of carboxylic acids derived from phenol derivatives in which at least one of the o-positions thereof is substituted, preferably substituted with a bulky group, and mono- or poly-hydric alcohols, and (2) esters of alcohols derived from polyhydric phenols in which at least one of the o-positions thereof is substituted, preferably substituted with a bulky group, and mono- or polycarboxylic acids, to reduce the thermal fog produced at the background after heat development processing, and to increase the whiteness of the unexposed areas and the stability to normal room illumination.

REFERENCES:
patent: 3330859 (1967-07-01), Dexter et al.
patent: 3661583 (1972-05-01), Van Der Voorn
patent: 3816132 (1974-06-01), Takegawa et al.
patent: 3827889 (1974-08-01), Ohkubo et al.
patent: 3885967 (1975-05-01), Sashihara et al.
patent: 3885968 (1975-05-01), Ikenoue et al.
J. M. Farber, "Adhesive Age", Aug. 1968, pp. 24-28, Publ. Geigy Industrial Chemicals, Ardsley, N.Y.

Affiliated with

Also associated with

Rating

Heat developable light-sensitive material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Heat developable light-sensitive material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Heat developable light-sensitive material will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-734176