Heat-developable light-sensitive material

Details Heat-developable light-sensitive material Heat-developable light-sensitive material

1985-08-26

1987-03-17

Louie, Won H.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Silver compound sensitizer containing

430619, 430620, 430955, 430203, 430151, 430171, 430562, 430607, 430611, 430613, 430614, G03C 102

Patent

active

046507493

ABSTRACT:
A heat developable light-sensitive material containing a compound represented by formula (I) or (II) ##STR1## wherein R.sub.1 and R.sub.2 each represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aralkyl group, an aryl group, a heterocyclic group, a carboxyl group or a salt thereof, a halogen atom, a cyano group, an alkylsulfonyl or arylsulfonyl group, a sulfamoyl group, a carbamoyl group, an alkoxycarbonyl or aryloxycarbonyl group, a di- or mono-alkylphosphoryl or arylphosphoryl group, a di- or mono-alkylphosphinyl or arylphosphinyl group, an alkylsulfinyl or arylsulfinyl group, an acyl group, an amino group, an acylamino group, an acyloxy group or a group represented by X; X represents a decarboxylation accelerating group; or any two of R.sub.1, R.sub.2, and X may combine to form a ring; and the groups represented by R.sub.1, R.sub.2 and X may further be substituted with a substituent; B represents an organic base; and n represents 1 when B represents a monoacid base or 2 when B represents a diacid base, provided that when ##STR2## is a free dibasic acid, n is 1/2 of the above described numbers, respectively.

REFERENCES:
patent: 3220846 (1965-11-01), Tinker et al.
patent: 4487826 (1984-12-01), Watanabe et al.
patent: 4514493 (1985-04-01), Hirai et al.

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