Heat developable light-sensitive material

Details Heat developable light-sensitive material Heat developable light-sensitive material

1985-08-26

1986-10-28

Louie, Won H.

Radiation imagery chemistry: process, composition, or product th

Thermographic process

Heat applied after imaging

430617, 430619, 430620, 430955, 430203, 430570, 430351, G03C 102

Patent

active

046198881

ABSTRACT:
A heat developable light-sensitive material comprising a support and a heat developable light-sensitive layer formed thereon can produce images of high density and less fog in a short period of time and has excellent aging stability. The light-sensitive material contains as a base precursor at least one compound selected from the group consisting of compounds represented by formula [I]: ##STR1## wherein R.sup.1 and R.sup.2 individually represent hydrogen, alkyl, cycloalkyl, alkenyl, alkynyl, aryl, aralkyl, heterocyclic group, or --CO.sub.2 M wherein M represents hydrogen, alkali metal or H.Bx, and R.sup.1 and R.sup.2 can be joined together to form a ring; R.sup.3 represents hydrogen atom, alkyl, cycloalkyl, alkenyl, alkynyl, aralkyl, aryl, or heterocyclic group; x is equal to 1 when B represents a monoacidic base and equal to 1/2 when B represents a diacidic base; and C* represents an asymmetric carbon atom.

REFERENCES:
patent: 4499172 (1985-02-01), Hirai et al.

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