Heat developable light-sensitive material

Details Heat developable light-sensitive material Heat developable light-sensitive material

1985-08-23

1987-02-03

Louie, Won H.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified radiation sensitive composition with color...

430617, 430619, 430620, 430955, 430151, 430171, 430179, 430495, 430570, 430559, 430561, 430562, 430563, G03C 106, G03C 524

Patent

active

046408916

ABSTRACT:
A heat developable light-sensitive material having an excellent stability with time and capable of providing a high quality image is disclosed, which contains a base precursor represented by the following general formula (I): ##STR1## wherein A represents an organic residue represented by the following formula (II): ##STR2## X represents an electron attractive substituent having a Hammett's sigma value of more than 0;

REFERENCES:
patent: 4487826 (1984-12-01), Watanabe et al.
patent: 4514493 (1985-04-01), Hirai et al.
patent: 4560763 (1985-12-01), Sato et al.

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