Heat developable light-sensitive material

Details Heat developable light-sensitive material Heat developable light-sensitive material

1985-10-30

1987-03-10

Louie, Won H.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Silver compound sensitizer containing

430619, 430620, 430955, 430203, 430351, 430353, 430599, 430562, G03C 106

Patent

active

046491040

ABSTRACT:
A heat developable light-sensitive material is described, comprising a polymer containing as a constituent a repeating unit represented by formula (I) ##STR1## wherein R.sub.1 represents a hydrogen atom or a substituted or unsubstituted alkyl group having from 1 to 6 carbon atoms; L represents a divalent connecting group having from 1 to 20 carbon atoms; M represents a cation and x represents a number which is the same as the charge number of the cation represented by M.
The polymer containing the repeating unit represented by formula (I) is a base precursor which is stable at normal temperature, but rapidly decomposes to release a base by heating; therefore, the heat developable light-sensitive material containing the base precursor has excellent preservability and provides images having good image quality, i.e., low fog density and high image density, upon a short period of developing time.

REFERENCES:
patent: 3220846 (1965-11-01), Tinker et al.
patent: 4499172 (1985-02-01), Hirai et al.

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